Focused Ion Beam Microscopy (FIB)
The Cleanroom at LCN on the Bloomsbury site has 255 square metres of ISO 14644-1 Class 6 (Class 1000) cleanroom housing most of our equipment for Plasma etch, Photolithography, Wet Chemical, Metallisation, Furnace, Characterisation and Electron Beam Lithography processes.
Carl Zeiss ORION NanoFab -
A Multibeam Ion (Helium & Neon) Microscope for Sub-10nm Nanostructuring
Main Features:
