The Cleanroom at LCN on the Bloomsbury site has 255 square metres of ISO 14644-1 Class 6 (Class 1000) cleanroom housing most of our equipment for Plasma etch, Photolithography, Wet Chemical, Metallisation, Furnace, Characterisation and Electron Beam Lithography processes.
This a a large metal chambered Plasma Cleaner, that uses microwave energy to create a plasma of either Oxygen, Argon or Air. The chamber configuration makes this machine suitable for non planar and three dimensional substrates such as mechanical components and wire bonding substrates.
The Plasma Pro NGP80 offers versatile plasma etch and deposition solutions on one platform with convenient open loading. This compact, small footprint system is easy to site and easy to use, with no compromise on process quality.
This is a Plasma etcher in a barrel configuration. It is used primariliy for removing organic materials in an Oxygen plasma, such as photoresist. It is an effective technique for cleaning up the residues of photoresist that remain after the Photolithography and develop processes before samples