Characterisation

The LCN currently has three Bruker MultiMode 8 AFMs which are equipped with an E scanner or J scanner (with heater) and uses the unique PeakForce Tapping™ technology to provide new information, faster results and greatly improved ease of use.

This instrument is designed for rapid access to images for cleanroom samples with no sample prepartion.  Samples can range from small pieces, up to 100mm wafers mounted on dedicated wafer holders.  It has a LaB6 source and a resolution of 2nm.

This is the FFP5000 model of probe equipped with an external probe and sample holder.  The stage is capable of accepting wafers up to 100mm diameter and has indexed locations to permit reproducable positioning.

This equipment has a spectroscopic source and operates between 400 and 840nm.  The software is fully configurable to enable the measurement thickness and optical properties of the thin transparent films encountered within the cleanroom such as Silicon Oxide, Nitride and Oxynitride, organic layers

The DektakXT is the 10th generation, and latest, profiler from the Dektak Range.  It is fast, and has an automated XY Theta sample stage.  Vertical reproducibility is 5 Angstrom, and it can measure steps from nm to 1mm deep.  It can handle samples that are up to 35mm thick, and up to 300mm in dia

The Olympus BX51 upright microscope offers reflection mode (for opaque samples) and transmission light illumination.

Argon / Nitrogen sputter gun

Sample heating stage

Organic molecule evaporator

Temperature 2K – 350K
Ultra-high vacuum (better than 5 x 10-11 mbar)
Magnetic field: up to 6T in the vertical axis; up to 1T in either horizontal axis
Suite for sample preparation and analysis:
Metal evaporators
Argon / Nitrogen sputter gun

Low Temperature: 4K – 300K; Variable Temperature: 300K – 900K

Ultra-high vacuum (better than 5 x 10-11 mbar)