Carl Zeiss Focused Ion Beam Microscope
Technical specifications and key features
- Ultra high resolution FESEM with unique GEMINI column
- High performance CANION FIB column
- CrossBeam® operation: high resolution live imaging during milling and polishing
- Optional multi-channel gas injection system for material deposition and enhanced or selective etching
- Image archiving, networking and hardcopy solutions from the integral Windows® operating system
| SEM | FIB | |
| Resolution | 1.1 nm @ 20 kV | 7 nm @ 30 kV guaranteed, |
| 2.5 nm @ 1 kV | 5 nm achievable | |
| Magnification | 20x - 900kx | 600x - 500kx |
| Probe Current | 4 pA - 20 nA | 1 pA - 50 nA |
| Acceleration Voltage | 0.1 - 30 kV | 3 - 30 kV |
| Emitter | Thermal field emission type | Ga liquid metal ion source (LMIS) |