Rapid Thermal Processor (RTP)

Equipment manager:
Steve Etienne
Equipment manufacturer:
Surface Science Integration Inc.
Equipment model:
Solaris 150
Equipment technique:
Deputy equipment manager:
Vijayalakshmi Krishnan

System is found with power to RTP box off, no sounds of gas flowing and no water flow. The PC may be off, or at desktop.  There is a Pdf Manual: ‘ Solaris 150 installation.pdf’  located on Desktop


Run Solaris 3.7 programme on desktop

Click Start RTP Process button


Click Recipe Management button

Asks Recipe Edit?  Click Yes

Asks Edit Existing or New? Click Edit existing

All files called ’MODEL xxxx’ are the default recipes for a range of temperatures you may wish to use. Select the one at the nearest temperature as a template for your own, as this will have the nearest best parameters for temp control.  Always save edited files under a new name, and DO NOT overwrite the MODEL recipes.

Double click on file you want to examine or edit.

Click enter on password page (password is blank)

Examine recipe and modify if needed.

Exit by clicking save for no changes, save as if you have changes


NOTE: always validate a new process using the learn mode with an accurate dummy sample before running on real samples.

Click Run Process button (NB never select the Run Open Loop process option)

On RTP unit:

Press power on (may have to twist release the EMO button) and note sound of gas flow and confirm water flow in float meter behind, if not inform technical staff.

Lower door lever, and carefully with both hands gently pull out the door and attached sample tray. 

If there is any sticking, movement between  door & rod connection or damage, Report to technical staff for assessment before going further.

Remove wafer with tweezers and place on clean surface.  Place your sample on wafer, then replace wafer carefully.

Close door carefully and raise lever to lock.

On PC:

Select Recipe

Either do a validation Run: Check ‘Learn Mode ON’ is displayed in Green button, Click it to change if needed

Or a standard Run: Check ‘Learn Mode OFF’ is displayed in Red button, Click it to change if needed

Click Start

Enter Sample name, Username and Notes in documentation window

Click Start Process

Observe graphically the procedure, The process status is shown next to  ‘Process Running’ which displays either a green RUNNING  button  or a dark green blank when complete.  Completion  will only occur if the system has finished learning and the temperature is below 325 degrees.

Click Store Data button, enter a filename for run

Wait until Control temperature falls below a safe temperature for your samples before opening door.  If unsure wait until it is below 100C.


Write up your runs in the Logbook

Close door with support wafer on tray. Wait for Control Temp to fall below 80C. before turning off RTP unit with Red button..

Closedown and exit the software.


Maximum Gas flow is 10 litres per minute in total.

The gas flow is normally set to 9 litres per minute.  Mixtures should add up to this value.

NEVER Run H2/N2 and OXYGEN together, RISK of EXPLOSION

If you change the flow,  or the type of gas you will need to tune your recipe.

Maximum Ramp up Rate is 200°C per second.  Maximum Ramp down rate is 150°C per sec (temperature dependent)

Maximum Temperature is 1200°C for maximum 5 minutes hold time.


The SSI Inc Solaris 150 Rapid Thermal Processing System (RTP) is a proven, “state of the art” versatile tool for Silicide formation, metal Alloys Group III Nitrides Reflow: BPSG, PSG contact anneal, Ferroelectrics, Implant anneal, HBT & MESFET Solar Cells, Implant monitoring Thermal donor, Si-Ge and LEDs.

The Solaris 150 is a manually loaded Rapid Thermal Processing System. Capable of processing silicon, III-V and other substrates up to 150mm diameter. The maximum temperature of operation is 1100 C.

The Solaris 150 is equipped with recipe management, system diagnostics, and user-friendly interface for operator productivity.