Equipment manager
Steve Etienne
Equipment manufacturer
STPS
Equipment model
Multiplex
Equipment technique
Deputy equipment manager
VJ Krishnan
Equipment Location
Manuals
Standard Operating Procedure
Paper on Stress Control In PECVD Films
STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 6” diameter
Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2.
Deposition of silicon oxide, silicon nitride, and stress controlled siliocn oxynitride.