Plasma Enhanced CVD

STS PECVD
Equipment manager:
Steve Etienne
Equipment manufacturer:
STPS
Equipment model:
Multiplex
Equipment technique:
Deputy equipment manager:
VJ Krishnan
Manuals

Standard Operating Procedure

Paper on Stress Control In PECVD Films

STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 6” diameter

Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2.

Deposition of silicon oxide, silicon nitride, and stress controlled siliocn oxynitride.

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