Lesker Sputtering System

Lesker Sputter system
Equipment manager
Steve Etienne
Equipment manufacturer
Equipment model
Equipment technique
Deputy equipment manager
VJ Krishnan

Lesker PVD75 Sputter Coater system,

Equipped with three Magnetron sputter sources 3 inches in diameter, and any one of which can be selected in sequence. We can use RF or DC power to sputter insulating or conductive materials.  The substrate can be cleaned using  substrate RF Bias.

Oxygen can be injected to modify oxidation state of sputtered materials.  

Maximum sample size is 6” diameter, and any smaller samples can be accommodated.

Typical materials capability:

Insulators ZnO, ITO, SiO2.

Metals Cr, Cu, Al, Mo, Ta, Al, Au