Electron Beam Lithography

9th January 2013
Raith EBL
Equipment manager
Suguo Huo
Equipment manufacturer
Raith
Equipment model
150 TWO
Equipment technique
Electron Beam Lithography
Deputy equipment manager
Steve Etienne
Manuals

A datasheet including spin curves for PMMA is available here.

Negative E beam resist

Raith 150-TWO Electron Beam Lithography
Resolution 20nm 
Electron Beam resist processes
495 & 950 PMMA
Sample size from 10 x10mm up to 150mm diameter

Details on the LCN electron beam lithography (EBL) system can be provided by Suguo Huo and the EBL wiki.

 

The London Centre for Nanotechnology

A partnership between King's College London, UCL and Imperial College London: impact built on academic excellence.

Bloomsbury:

17-19 Gordon Street
London WC1H 0AH
tel: +44 (0)20 7679 0604
email: lcn-administrator@ucl.ac.uk

South Kensington:

Department of Materials
London SW7 2AZ
tel: +44 (0)20 7594 7252
email: lcn-administrator@imperial.ac.uk

Strand:

Department of Physics
Strand London WC2R 2LS
tel: +44 (0)207 848 2044
email: lcn@kcl.ac.uk

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