Electron Beam Lithography

Raith EBL
Equipment manager
Suguo Huo
Equipment manufacturer
Equipment model
150 TWO
Equipment technique
Deputy equipment manager
Steve Etienne

A datasheet including spin curves for PMMA is available here.

Negative E beam resist

Raith 150-TWO Electron Beam Lithography
Resolution 20nm 
Electron Beam resist processes
495 & 950 PMMA
Sample size from 10 x10mm up to 150mm diameter

Details on the LCN electron beam lithography (EBL) system can be provided by Suguo Huo and the EBL wiki.