Equipment manager
Steve Etienne
Equipment manufacturer
Diener
Equipment model
Nano
Equipment technique
Deputy equipment manager
Suguo Huo
Equipment Location
This is a Plasma etcher in a barrel configuration. It is used primariliy for removing organic materials in an Oxygen plasma, such as photoresist. It is an effective technique for cleaning up the residues of photoresist that remain after the Photolithography and develop processes before samples move on to subsequent stages.
It has Oxygen, Argon and Air available as feed gases.