Elionix Electron Beam Lithography

Image of Elionix EBL
Equipment manager
Suguo Huo
Equipment manufacturer
Equipment model
Equipment technique
Deputy equipment manager
Steve Etienne
Equipment Location

The Elionix ELS-G100 is a 100KV EBL system with a 100MHz pattern generator.

The system has 2 SE and 1 BSE detectors,  and a height sensor to keep your sample in focus during exposure.

In addition it has dynamic Focus and Stigmator adjustment to optimise beam shape at the edges of the field.

Write field sizes @ 100KV are 100µm, 250µm, 500µm, 1000µm.

Beam diameter is 1.8nm @100pA beam current is selectable up to 100nA.

Sample sizes from 3X3 mm up to full 6" wafers can be loaded and exposed

Objective apertures are 60, 120 and 240µm