Four x 2” sources
Ion Gun System for sample cleaning
Max sample size 3”
Metals include Nb, Au
three x 3” diameter sources, RF and DC
Substrate RF Bias, O2 injection
Max sample size 6”.
Insulators ZnO, ITO,...
Edwards A500 – FL500 Electron Beam Evaporator,
4 pocket Temescal Electron Beam gun
2 thermal sources
Max sample size 6”
Metals include Ti, Au, Mo, Pt
Raith 150-TWO Electron Beam Lithography
Electron Beam resist processes
495 & 950 PMMA
Sample size from 10 x10mm up to 150mm...
Carl Zeiss Axioskop Microscope & Camera,
Image Capture and processing software with feature measurement
Reflection and or Transmission...
Karl Suss MJB3 Mask Aligner for small and delicate substrates.
UV 300 Optics for 365nm photoresists
Samples of all shapes from 4mm square up to 3"...
Quintel Q4000-6 Mask Aligner
For whole wafers larger than 2" diameter up to 150 mm diameter
Mask Sizes from 4" square x 0.060", up to 7" square x 0....
STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 6” diameter
Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2.
Deposition of silicon oxide,...
Surface Technology Systems ICP RIE, + loadlock, samples up to 6” diameterGases: CH4, O2, H2, Ar, Cl, BCl3, SF6, He, N2Process recipes for etching:...
Surface Technology Systems ICP DRIE, + loadlock, samples up to 6” diameterGases: O2, Ar, SF6, CF4, C4F8Processes:Deep Silicon Etch (Bosch process) to...
Dicing saw capable of sawing flat substrates up to 150mm diameter.We can saw Glass, Quartz, Silicon and other materials by suitable choice of blades....
7T longitudinal magnet, temperature range 1.8-400K
Standard sample transport
Reciprocating sample option
14T longitudinal magnet, temperature range 1.8 - 400K (standard)
0.35K with Helium 3 probe
The LCN currently has two JPK Nanowizard 1 AFM's to provide high resolution imaging of biological samples using a closed feedback loop to ensure...
Fluorescence filter sets for 405, 488, 568, 647 nm excitation
Combined AFM capability with the JPK Nanowizard