This instrument is designed for rapid access to images for cleanroom samples with no sample prepartion. Samples can range from small pieces, up to 100mm wafers mounted on dedicated wafer holders. It has a LaB6 source and a resolution of 2nm.
This equipment has been removed from service on 24 June 2017. This is because it has suffered a filament failure, which is uneconomical to replace before it will be removed to make way for new equipment in October 2017.
Alternative SEM equipment are the Zeiss Focused Ion Beam Crossbeam, or for very high resolution the Carl Zeiss Orion Nanofab.