Atomic Layer Deposition (ALD) Equipment

Equipment

Overview
Ultratech Savannah Atomic Layer Deposition

We have a Savannah S200 ALD system, equipped with 6 precursor ports, a fomblin vacuum pump, Ozone generator and a Quartz Crystal Monitor.

  • Single combined vacuum and reaction chamber, providing:
    • High productivity in multi-user, mixed process environment through rapid temperature ramping by direct conductive heating of the substrate platen.
    • Minimal precursor consumption and short purge times through ultra-low volume of 430 cm^3.
    • Simple precursor residency extension by hardware stop valve (ExposureMode™) for HAR or porous substrates up to 2000:1, or future flexibility with low temperature processes.
    • Short learning curve and simple operation with no pressure balancing requirements.
  • Manifold delivery of precursors providing:
    • Robustness in multi‑user environment with inexperienced users through very short precursor tubing, (approx. 6cm from manual precursor valve to ALD valve) and reliable uniform heating of precursor paths.
    • Precursors exchange in minutes by the user with minimal training or clean room supervision.
    • Pre-conditioning of the precursor path (the manifold is a topological extension of the chamber) allowing option to precondition the total wetted route with a new solid surface which no-longer participates in the ALD process. (Not possible with single line delivery or delivery by two separate manifolds (precursor and oxidant separate manifolds).
    • Experiment flexibility in multi-user environment through all precursor ports being capable of liquid, solid and gaseous precursors interchangeably. 

Materials and Precursors at LCN

Port NumberFilmPrecursor acronymPrecursor name
1N/AH2ODI water
2Al2O3TMATrimethylaluminum
3HfO2TDMAHTetrakis(dimethylamido)hafnium(IV)
4SiO2TDMASTris(dimethylamino)silane
5ZrO2TDMAZTetrakis(dimethylamido)zirconium(IV)
6N/AOzoneOzone
  • Intuitive single-screen GUI for almost all system operations, providing:
    • Minimal user learning curve or supervision requirements.
    • Multi-user productivity.
    • Windows 7 operation.
  • Free daily support via ALDSupport@ultratech.com providing:
    • Scientist to scientist support.
    • Typically same day detailed response and continued dialogue.
    • Process and recipe support.
    • Maintenance support.
  • Free access to recipe database providing:
    • Access to fully detailed and qualified recipe sheets for the full Ultratech database.
    • (As a starting point, system will be delivered with fully detailed recipes for aluminium oxide, hafnium oxide, silicon oxide and zirconium oxide.)
  • Local UK maintenance support through Omni/IES Engineers.