Oxford Instruments, a leader in plasma etch and deposition equipment and processes, has recently installed and commissioned a PlasmaPro NGP80 RIE etch system in the London Centre for Nanotechnology (LCN) for use in their research.
The PlasmaPro NGP80 is a compact, small footprint system that is easy to site and operate, without compromising on process quality. It can process from the smallest wafer pieces to 200mm wafers, while the open load design allows fast wafer loading and unloading, ideal for the research being undertaken at LCN.
Steve Etienne, Cleanroom Manager of the LCN commented, “The LCN is a multidisciplinary enterprise operating at the forefront of science and technology, whose purpose is to solve global problems in information processing, healthcare, energy and environment through the application of nanoscience and nanotechnology. We chose the Oxford Instruments tool for our research programme as the excellent technical specification suited our requirements, and in addition, the well founded reputation of their processing tools is backed up by expert specialist support.”
“We are very excited that our systems are being used in medical research at the LCN“, commented Mark Vosloo, Sales, CS and Marketing Director for Oxford Instruments Plasma Technology, “Oxford Instruments’ large Process Applications and Technology teams constantly research to innovate and offer new processes on our portfolio of advanced plasma etch and deposition processes and techniques. Through focusing on our customers’ current and future needs, Oxford Instruments is able to provide leading process solutions, maintained through our excellent global support network.”