Clean Room Training Schedule

LCN cleanroom training schedule for 2008.

All users who require access to the cleanroom must attend specific training sessions. Please read through the session descriptions below and how to book your attendance.

1. CLEANROOM INDUCTION and ACCESS (compulsory attendance for cleanroom access)
It is essential for any user to attend this session once and pass a set of tests before unaccompanied access to the cleanroom is allowed. Please note that if you have already attended this session and passed the test you do not need to attend again.

NEXT SESSION: Friday 15 August ,13:30,  in LCN 5th Floor Visualisation Suite, 

EQUIPMENT INDUCTION
These are training sessions (mostly demonstrations) for specific and commonly used equipment. The first of these, focusing on basic characterisation techniques, is highly recommended to all users. All users intending to attend other equipment training sessions will be expected to know how to use the characterisation equipment.

2. Height and Width Characterisation (highly recommended attendance)
Included are optical microscope with a camera, alpha-step (surface profiler), Dektak (surface profiler), reflectometry, ellipsometry, etc. This is an introductory level course. Any user wishing to process planar/substrate samples should attend.

3. Wet chemical chemical benches for small size substrates (e.g. up to 1 inch)
Will include basic cleaning techniques (solvent, acid, piranha, HF). Any user wishing to fabricate planar devices should attend. Users with larger (4 inch) wafers should ask the cleanroom team for a separate training session as handling tools will be different in that case.

4. Lithography for small size substrates (e.g. up to 1 inch diameter and odd shapes)
Will cover how to define patterns with resist coating, UV exposure with a mask aligner and developing. Users with larger (4 inch) wafers should ask the cleanroom team for a separate training session as handling tools will be different in that case.

5. Thin film coating with thermal and electron-beam evaporators
Included are 3 thermal evaporators and 1 electron-beam+thermal evaporator for metal coating on substrates.

Special Requests

For example SU-8 process, 4 inch wafer processes, other equipment (furnaces, wafer bonding, dicing, wire bonding, etc.), Plasma processes.
Requests are invited for training in small groups for any cleanroom equipment. Please feel free to contact the cleanroom team for discussing/advising any particular sequence of fabrication processes you may require.

Attending training sessions - application process
If you want to attend one or more of the sessions above please get approval from your supervisor or PI first. Fill in the booking form provided (word document below) and send it via email to lcn-support@ee.ucl.ac.uk. Remember to CC your supervisor or PI on this email.

Please download the Training booking form.