A joint venture between UCL and Imperial College London
Thermal Processing
HITECH 4” wafer Furnace, three zone with automatic process control
- Typically 1050ºC, Gases: O2, N2, 5%H2/N2
Jipelec Rapid Thermal Processor up to 4” wafers,
- 1050ºC, O2, N2, 5%H2/N2
