Plasma Enhanced CVD

MV Systems PECVD, two chambers and integral load lock. Samples up to 150mm square

•  Chamber 1: Gases: H2, He, SiH4, CF4+O2; for intrinsic amorphous Si
• Chamber 2: Gases: H2, He, SiH4, CF4+O2, CH4, NH3, N2O, PH3(in H2), B2H6(in H2), N2; For intrinsic, n-type and p-type doped Si and dielectrics;

STS Multiplex PECVD, Dual frequency RF, + loadlock, samples up to 150mm diameter

• Gases: NH3, N2O, O2, SiH4, CF4+ O2, N2
• Deposition of Silicon Oxide, Silicon Nitride, and stress controlled Silicon Oxynitride