A joint venture between UCL and Imperial College London
Optical Photolithography
Karl Suss MJB3 Mask Aligner, small and delicate substrates UV 400 and UV 300 modes
Quintel Q4000-6 Mask Aligner larger wafers, Infra Red back side alignment.
- Positive resists: S1805, S1818, SPR220-7 & LOR lift off resist
- Negative resists: SU8, 2 - 100 µm thick
- Substrates from 4mm square to 150mm diameter, diamond, Silicon, III/V & glass
